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For the Inventor, By the Inventor

Hsin-Chu, Taiwan

Chih-Hung Wang

USPTO Granted Patents = 11 

Average Co-Inventor Count = 5.4

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Jhonghe, TW (2004)
  • Hsin-Chu, TW (2014 - 2023)
  • Hsinchu, TW (2024)

Company Filing History:

goldMedal11 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2004-2025

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11 patents (USPTO):Explore Patents
1. 12317602 - Forming ESD devices using multi-gate compatible processes (2025-05-27),
2. 12255201 - ESD structure (2025-03-18),
3. 12078551 - Complementary bipolar junction transistor (2024-09-03),
4. 11948936 - Forming ESD devices using multi-gate compatible processess (2024-04-02),
5. 11855073 - ESD structure (2023-12-26),
6. 11837459 - Method and structure for diodes with backside contacts (2023-12-05),
7. 11637099 - Forming ESD devices using multi-gate compatible processes (2023-04-25),
8. 11532607 - ESD structure and semiconductor structure (2022-12-20),
9. 9111768 - Semiconductor devices, methods of manufacture thereof, and methods of forming resistors (2015-08-18),
10. 8859386 - Semiconductor devices, methods of manufacture thereof, and methods of forming resistors (2014-10-14),
11. 6797587 - Active region corner implantation method for fabricating a semiconductor integrated circuit microelectronic fabrication (2004-09-28),

Title: Chih-Hung Wang: Innovator in Semiconductor Technology

Introduction

Chih-Hung Wang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on enhancing the performance and reliability of electronic devices through innovative designs and processes.

Latest Patents

Chih-Hung Wang's latest patents include advancements in forming electrostatic discharge (ESD) devices using multi-gate compatible processes. One of his notable inventions describes a semiconductor device that features a semiconductor substrate and an epitaxial stack with alternating layers of different material compositions. This design incorporates doped regions with varying conductivity types, enhancing the device's functionality. Another patent details an ESD structure that includes multiple semiconductor layers and conductive features, strategically placed to improve the device's resilience against electrostatic discharge.

Career Highlights

Chih-Hung Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Chih-Hung Wang has collaborated with notable colleagues, including Tung-Heng Hsieh and Ming-Shuan Li. Their combined efforts have contributed to the advancement of semiconductor research and development.

Conclusion

Chih-Hung Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape the future of electronic devices and their applications.

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