Location History:
- Feng Shan, TW (1999)
- Hsinchu, TW (1999 - 2001)
Company Filing History:
4 out of 130 
4 out of 7,088 
1 out of 4 Years Active: 1999-2001
Title: Innovator Profile: Chih-Ching Hsu from Hsinchu, Taiwan
Introduction: Chih-Ching Hsu is a prominent inventor based in Hsinchu, Taiwan, recognized for his significant contributions in the field of semiconductor technology. With a total of 10 patents to his name, Hsu has demonstrated a commitment to pushing the boundaries of innovation within this critical industry.
Latest Patents: Among Hsu's latest innovations are groundbreaking methods that enhance the functionality of semiconductor materials. One of his noteworthy patents is a Method of forming fluorosilicate glass (FSG) layers with moisture-resistant capability. This method focuses on creating FSG layers that serve as inter-metal dielectric (IMD) layers in semiconductor wafers while ensuring high moisture-resistant properties. The innovative aspect of this approach is its ability to maintain low RC delay in the resulting semiconductor circuit. This is achieved through a specialized plasma treatment using ionized ammonia gas, resulting in a protective nitrogen-containing compound layer.
Another significant patent is his Method of planarizing dielectric layer. This process involves multiple steps, starting with a substrate that already has structures formed. A borophosphosilicate glass layer is then applied, followed by a rapid thermal process to induce thermal flow. After etching back the layer, a passivation layer is added to ensure the prevention of pit formation during pre-metal wet etching operations.
Career Highlights: Throughout his career, Chih-Ching Hsu has worked with notable companies including United Semiconductor Corporation and United Microelectronics Corporation. His experience in these organizations has undoubtedly contributed to his expertise and innovation in semiconductor processes.
Collaborations: Hsu has collaborated with distinguished colleagues such as Shu-Jen Chen and Brian Wang, further amplifying the impact of his work through teamwork and collective knowledge.
Conclusion: Chih-Ching Hsu’s innovative methods in forming moisture-resistant FSG layers and planarizing dielectric layers underscore his role as a leading inventor in the semiconductor industry. His contributions, along with his collaborations with industry experts, highlight the continuous evolution of technology in this dynamic field. As Hsu continues to innovate, his work is likely to pave the way for future advancements in semiconductor technology.