Chien-wei Lee

Title: Innovations of Chien-wei Lee

Introduction

Chien-wei Lee is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device manufacturing.

Latest Patents

One of his latest patents is titled "Nanosheet semiconductor device and method for manufacturing the same." This patent describes a method for creating a nanosheet semiconductor device, which involves forming a poly gate on a nanosheet stack. The stack consists of alternating first and second nanosheets, followed by recessing the stack to create a source/drain recess near the poly gate. The process also includes forming an inner spacer that covers the first nanosheet and selectively etching the second nanosheet.

Another notable patent is the "FinFET structure and method for manufacturing thereof." This patent outlines a FinFET structure that includes a substrate and a fin protruding from it. The fin has two portions with varying dopant concentrations, and the design incorporates a gate over the fin and an insulating layer that enhances the device's performance.

Career Highlights

Chien-wei Lee is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving manufacturing processes.

Collaborations

He collaborates with notable colleagues, including Chun Hsiung Tsai and Lai-Wan Chong, who contribute to his innovative projects and research efforts.

Conclusion

Chien-wei Lee's contributions to semiconductor technology through his patents reflect his expertise and commitment to innovation. His work continues to influence the industry and pave the way for future advancements.