Chieh-Ping Wang

Title: Innovations of Chieh-Ping Wang

Introduction

Chieh-Ping Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on innovative solutions that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest patents is the "Cut metal gate refill with void." This invention describes a method for etching a gate stack to create a trench that separates the gate stack into two portions. A dielectric material is deposited in the trench, forming a dielectric region with an air gap. This air gap extends upward, providing electrical isolation between the two gate stack portions. Another notable patent is the "Semiconductor device with isolation structure." This patent outlines a semiconductor device featuring fin structures with varying dielectric constants and a method for fabricating these structures. The device includes pairs of gate structures that are electrically isolated from each other, enhancing the overall functionality of the semiconductor.

Career Highlights

Chieh-Ping Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor technologies, contributing to the company's reputation for innovation and excellence.

Collaborations

He has collaborated with notable colleagues, including Ting-Gang Chen and Tai-Chun Huang, further enriching the collaborative environment within his workplace.

Conclusion

Chieh-Ping Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.