Chieh Ju Wang

Title: Innovations of Chieh Ju Wang

Introduction

Chieh Ju Wang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of microelectronics, holding a total of five patents. His work primarily focuses on methods and compositions that enhance semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Selectively etching materials." This patent describes a method for selectively removing aluminum oxide or nitride material from a microelectronic substrate. The method involves contacting the material with an aqueous etching composition that includes an etchant with a source of fluoride and a metal corrosion inhibitor, maintaining a pH range of 3 to 8. Another significant patent is "Post-etch residue removal for advanced node BEOL processing." This patent relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing materials, such as aluminum oxide, during semiconductor production. The compositions are designed to have high selectivity for these materials compared to low-k dielectric materials and other metals.

Career Highlights

Chieh Ju Wang has worked with Entegris, Inc., where he has contributed to advancements in semiconductor technologies. His expertise in etching and cleaning compositions has been instrumental in improving manufacturing efficiency and product quality.

Collaborations

Throughout his career, Chieh Ju Wang has collaborated with notable colleagues, including Chia-Jung Hsu and Emanuel Israel Cooper. These collaborations have fostered innovation and development in the microelectronics field.

Conclusion

Chieh Ju Wang's contributions to microelectronics through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence semiconductor manufacturing processes and improve technology.