Hsin-Chu, Taiwan

Chie-Ming Yang


Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1999-2008

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4 patents (USPTO):Explore Patents

Title: Innovations of Chie-Ming Yang

Introduction

Chie-Ming Yang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on improving fabrication methods and enhancing the performance of materials used in the industry.

Latest Patents

One of his latest patents is a method for implementing an engineering change across fabrication facilities. This method involves identifying a proposed new or modified fabrication method, evaluating it against decision criteria, and verifying its effectiveness in producing different products across multiple facilities. If the method meets the criteria, it is adopted as the best known method among the facilities.

Another significant patent is a method to improve the adhesion of molding compounds by providing an oxygen-rich film over the top surface of a passivation layer. This innovative approach treats the surface of a passivation layer, which may consist of silicon dioxide or silicon nitride, by creating an oxygen-rich layer that enhances adhesion.

Career Highlights

Chie-Ming Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative methods have contributed to advancements in fabrication processes, making a notable impact on the efficiency and quality of semiconductor manufacturing.

Collaborations

Chie-Ming Yang has collaborated with several talented individuals in his field, including Shih-Wen Tu and Ko-Pin Lee. These collaborations have fostered a creative environment that encourages the development of new ideas and solutions in semiconductor technology.

Conclusion

Chie-Ming Yang's contributions to the semiconductor industry through his patents and innovative methods highlight his role as a key inventor in the field. His work continues to influence the efficiency and effectiveness of fabrication processes in semiconductor manufacturing.

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