Company Filing History:
Years Active: 1996-2004
Title: Innovations of Cheng-Yeh Shih in Semiconductor Technology
Introduction
Cheng-Yeh Shih is a prominent inventor based in Hsin-Chu, Taiwan, known for his significant contributions to semiconductor technology. With a total of 18 patents to his name, he has made remarkable advancements in the field, particularly in the development of improved structures for semiconductor devices.
Latest Patents
One of his latest patents is focused on a capacitor with a roughened silicide layer. This process enhances the surface area of a storage node electrode for DRAM cells by forming an agglomerated metal silicide layer on its top surface. The method involves creating a polysilicon storage node electrode shape, followed by the formation of an overlying agglomerated titanium disilicide layer through a rapid thermal annealing (RTA) procedure.
Another notable patent is a method for making an improved field oxide isolation structure for semiconductor integrated circuits. This innovation achieves higher field oxide threshold voltages and reduced leakage currents between adjacent device areas. The method utilizes the conventional local oxidation of silicon (LOCOS) technique, employing a patterned silicon nitride layer as a barrier to oxidation. After forming the LOCOS field oxide, a conformal insulating layer of silicon oxide is deposited and etched back to create sidewall insulating portions, enhancing the overall performance of DRAM cells.
Career Highlights
Cheng-Yeh Shih is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in improving the efficiency and reliability of semiconductor devices, particularly in the realm of DRAM technology.
Collaborations
He has collaborated with notable colleagues such as Kuo Ching Huang and Yu-Hua Lee, contributing to various projects that have furthered advancements in semiconductor research and development.
Conclusion
Cheng-Yeh Shih's innovative work in semiconductor technology has led to significant advancements that enhance the performance of electronic devices. His contributions continue to shape the future of the industry, making him a key figure in the field of semiconductor research.
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