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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Cheng-Hsiung Matthew Tsai

USPTO Granted Patents = 16 

Average Co-Inventor Count = 4.3

ph-index = 5

Forward Citations = 62(Granted Patents)


Company Filing History:

goldMedal16 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2015-2025

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16 patents (USPTO):
1. D1071886 - Substrate support for a substrate processing chamber (2025-04-21),
2. 12228395 - Substrate position calibration for substrate supports in substrate processing systems (2025-02-18),
3. D1040304 - Deposition ring for physical vapor deposition chamber (2024-08-27),
4. 12014906 - High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber (2024-06-18),
5. 11961723 - Process kit having tall deposition ring for PVD chamber (2024-04-16),
6. 11955362 - Substrate support for reduced damage substrate backside (2024-04-09),
7. 11939666 - Methods and apparatus for precleaning and treating wafer surfaces (2024-03-26),
8. 11887878 - Detachable biasable electrostatic chuck for high temperature applications (2024-01-30),
9. D960216 - Base plate for a processing chamber substrate support (2022-08-09),
10. D947914 - Base plate for a processing chamber substrate support (2022-04-05),
11. 10892180 - Lift pin assembly (2021-01-12),
12. 10593521 - Substrate support for plasma etch operations (2020-03-17),
13. 9608549 - Electrostatic chuck (2017-03-28),
14. 9252002 - Two piece shutter disk assembly for a substrate process chamber (2016-02-02),
15. 9147558 - Finned shutter disk for a substrate process chamber (2015-09-29),

Title: Cheng-Hsiung Matthew Tsai: Innovator in Substrate Processing Technologies

Introduction

Cheng-Hsiung Matthew Tsai is a prominent inventor based in Cupertino, CA (US). He has made significant contributions to the field of substrate processing, holding a total of 16 patents. His work focuses on enhancing the efficiency and accuracy of substrate processing systems.

Latest Patents

Among his latest patents are innovative technologies such as "Substrate support for a substrate processing chamber," "Substrate position calibration for substrate supports in substrate processing systems," and "Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems." These patents provide methods for accurately positioning substrates on supports, which is crucial for various manufacturing processes.

Career Highlights

Cheng-Hsiung Matthew Tsai is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His expertise in substrate processing has positioned him as a key player in the development of advanced manufacturing technologies.

Collaborations

He has collaborated with notable colleagues such as Steven Victor Sansoni and Mukund Sundararajan, contributing to a dynamic work environment that fosters innovation and technological advancement.

Conclusion

Cheng-Hsiung Matthew Tsai's contributions to substrate processing technologies have made a significant impact in the industry. His innovative patents and collaborative efforts continue to drive advancements in manufacturing processes.

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