Company Filing History:

6 out of 3,595

Macronix International Co., Ltd.

patents

6 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2002-2014

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8834671 - Apparatus and method for controlling silicon nitride etching tank (2014-09-16),

2. 8409997 - Apparatus and method for controlling silicon nitride etching tank (2013-04-02),

3. 8012922 - Wet cleaning solution (2011-09-06),

4. 8012846 - Isolation structures and methods of fabricating isolation structures (2011-09-06),

5. 7795644 - Integrated circuits with stress memory effect and fabrication methods thereof (2010-09-14),

6. 7678694 - Method for fabricating semiconductor device with silicided gate (2010-03-16),

7. 6998316 - Method for fabricating read only memory including a first and second exposures to a photoresist layer (2006-02-14),

8. 6734064 - Method for fabricating read only memory including forming masking layers with openings and pre-coding the cell and peripheral regions (2004-05-11),

9. 6670247 - Method of fabricating mask read only memory (2003-12-30),

10. 6468897 - Method of forming damascene structure (2002-10-22),

11. 6448136 - Method of manufacturing flash memory (2002-09-10),

12. 6444521 - Method to improve nitride floating gate charge trapping for NROM flash memory device (2002-09-03),

Title: Pioneering Inventor Cheng-Chen Calvin Hsueh: Pushing Boundaries of Innovation

Introduction:

Cheng-Chen Calvin Hsueh, a visionary inventor based in Linkou, Taiwan, has made significant contributions to the world of technology with his innovative patents. With a total of 12 patents to his name, Hsueh's expertise and dedication to excellence have cemented his legacy as a pioneering figure in the field of inventions.

Latest Patents:

One of Hsueh's latest patents includes an "Apparatus and Method for Controlling Silicon Nitride Etching Tank." This groundbreaking method and system enable the precise control of silicon concentration in phosphoric acid within an etching bath, ensuring optimal silicon nitride/silicon oxide etch selectivity. By adding fresh, heated phosphoric acid as needed, silica precipitation is prevented, maintaining the desired concentration levels for efficient etching processes.

Career Highlights:

Throughout his career, Cheng-Chen Calvin Hsueh has made remarkable strides in the technology sector. He has worked with prominent companies such as Macronix International Co., Ltd. and Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), where his expertise and innovative solutions have driven advancements in semiconductor manufacturing processes.

Collaborations:

Hsueh has collaborated with esteemed professionals in the industry, including Zin-Chang Wei and Tsung-Min Huang. Together, they have leveraged their collective knowledge and skills to tackle complex technological challenges and develop cutting-edge solutions that have left a lasting impact on the field of innovation.

Conclusion:

Cheng-Chen Calvin Hsueh's relentless pursuit of excellence and passion for innovation have set him apart as a trailblazing inventor. His inventive spirit continues to inspire future generations to explore new frontiers and redefine the possibilities within the realm of inventions.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.