Changyok Park

Title: Innovations by Changyok Park

Introduction

Changyok Park is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of integrated circuit technology, holding a total of five patents. His work focuses on enhancing the performance and efficiency of decoupling capacitors, which are crucial for high-speed microprocessor applications.

Latest Patents

One of Changyok Park's latest patents involves decoupling capacitors based on dummy through-silicon-via plates. This innovation discloses integrated circuit structures that utilize dummy TSV plates within a support structure, such as a substrate or chip. The design includes first and second capacitor plates separated by a capacitor insulator, with openings filled with conductive materials. This approach allows for better integration of on-chip decoupling capacitors, providing ample capacitive decoupling without additional processing steps. Another patent describes a capacitor formed with coupled dies, where two dies are coupled to create a trace pattern. This design features an interdigitated pattern that enhances the capacitor's performance.

Career Highlights

Changyok Park is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has positioned him as a key contributor to advancements in microprocessor technology.

Collaborations

Throughout his career, Changyok Park has collaborated with notable colleagues, including Andy Chih-Hung Wei and Guillaume Bouche. These collaborations have further enriched his contributions to the field of integrated circuits.

Conclusion

Changyok Park's innovative work in decoupling capacitors and integrated circuit technology has made a significant impact on the industry. His patents reflect a commitment to enhancing the performance of microprocessors, showcasing his expertise and dedication to innovation.