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For the Inventor, By the Inventor

San Ramon, CA, United States of America

Byungkook Kong

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2015-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byungkook Kong. Retrieved from https://idiyas.com/inventor/byungkook-kong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 50.0

Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:

goldMedal10 out of 14,433 
 
Applied Materials, Inc.
 patents

Years Active: 2015-2020

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10 patents (USPTO):Explore Patents
1. 10847368 - EUV resist patterning using pulsed plasma (2020-11-24),
2. 10727075 - Uniform EUV photoresist patterning utilizing pulsed plasma process (2020-07-28),
3. 10580657 - Device fabrication via pulsed plasma (2020-03-03),
4. 10347500 - Device fabrication via pulsed plasma (2019-07-09),
5. 9627216 - Method for forming features in a silicon containing layer (2017-04-18),
6. 9418867 - Mask passivation using plasma (2016-08-16),
7. 9390923 - Methods of removing residual polymers formed during a boron-doped amorphous carbon layer etch process (2016-07-12),
8. 9299580 - High aspect ratio plasma etch for 3D NAND semiconductor applications (2016-03-29),
9. 9287124 - Method of etching a boron doped carbon hardmask (2016-03-15),
10. 9064812 - Aspect ratio dependent etch (ARDE) lag reduction process by selective oxidation with inert gas sputtering (2015-06-23),

Title: Byungkook Kong: Innovator in EUV Technologies

Introduction

Byungkook Kong is a prominent inventor based in San Ramon, CA (US). He has made significant contributions to the field of EUV (Extreme Ultraviolet) technologies, holding a total of 10 patents. His work focuses on advanced methods for patterning substrates, which are crucial in semiconductor manufacturing.

Latest Patents

Kong's latest patents include innovative techniques such as "EUV resist patterning using pulsed plasma." This patent describes a process where a coating layer is deposited on a patterned feature on a substrate, followed by etching a second portion of the substrate outside the patterned feature. Both etching and depositing occur in a single pulsed plasma process, utilizing pulsed source power and bias power signals. Another notable patent is "Uniform EUV photoresist patterning utilizing pulsed plasma process." This invention outlines a method for forming features in a material layer using EUV technologies, involving a patterned photoresist layer with openings of varying widths and a compensatory layer to modify these widths.

Career Highlights

Kong is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His expertise in EUV technologies has positioned him as a key player in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Throughout his career, Kong has collaborated with notable colleagues, including Hoon Sang Lee and Sang Wook Kim. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.

Conclusion

Byungkook Kong's contributions to EUV technologies and his impressive portfolio of patents highlight his role as a leading inventor in the semiconductor industry. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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