The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Jan. 10, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Byungkook Kong, San Ramon, CA (US);
Hung Sang Kim, San Ramon, CA (US);
Hoon Sang Lee, Hwasung, KR;
Jeong Hyun Yoo, Gyeonggi-do, KR;
Jun-Wan Kim, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 21/308 (2006.01); H01L 21/3213 (2006.01); H01L 21/30 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); H01L 21/02118 (2013.01); H01L 21/02274 (2013.01); H01L 21/3086 (2013.01); H01L 21/31122 (2013.01); H01L 21/32139 (2013.01); H01L 21/3003 (2013.01);
Abstract
A gas comprising hydrogen is supplied to a plasma source. Plasma comprising hydrogen plasma particles is generated from the gas. A passivation layer is deposited on a first mask layer on a second mask layer over a substrate using the hydrogen plasma particles.