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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9287124 B1

PDFFull Text
Expired
Date of Patent:
Mar. 15, 2016

Filed:

Sep. 02, 2014

Method of etching a boron doped carbon hardmask

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Byungkook Kong, San Ramon, CA (US);

Jun Wan Kim, San Jose, CA (US);

Wonmo Ahn, Fremont, CA (US);

Jeong Hyun Yoo, Hwaseong-si, KR;

Hun Sang Kim, San Ramon, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:

Patterson & Sheridan, LLP

Primary Examiner:

Lan Vinh

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/683 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01L 21/31122 (2013.01); H01L 21/6831 (2013.01); H01J 2237/334 (2013.01);
Abstract

In one embodiment, a method is proposed for etching a boron dope hardmask layer. The method includes flowing a process gas comprising at least CHinto a processing chamber. Forming a plasma in the process chamber from the process gas and etching the boron doped hardmask layer in the presence of the plasma. In other embodiments, the process gas utilized to etch the boron doped hardmask layer includes CH, Cl, SFand O.

Find Patent Forward Citations

Kong, Byungkook. (2016). Method of etching a boron doped carbon hardmask (U.S. Patent No. 9287124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9287124

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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