The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Apr. 07, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Byungkook Kong, San Ramon, CA (US);
Sangwook Kim, Palo Alto, CA (US);
SeungHyun Park, San Jose, CA (US);
Abhjeet Bagal, Sunnyvale, CA (US);
Kyoungjin Lee, Belmont, CA (US);
Daksh Agarwal, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01J 37/32 (2013.01); H01J 37/321 (2013.01); H01J 37/32146 (2013.01); H01J 37/32706 (2013.01); H01L 21/31122 (2013.01); H01L 21/31144 (2013.01);
Abstract
A coating layer is deposited on a patterned feature on a first portion of a substrate. A second portion of the substrate outside the patterned feature is etched. The etching and the depositing are performed in a single pulsed plasma process using at least one of a pulsed source power signal and a pulsed bias power signal.