Daksh Agarwal

Title: Daksh Agarwal: Innovator in Plasma Processing Technologies

Introduction

Daksh Agarwal is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of plasma processing, particularly in the semiconductor industry. With two patents to his name, Agarwal's work focuses on enhancing wafer processing techniques.

Latest Patents

Agarwal's latest patents include innovative methods for plasma processing of wafers. The first patent, titled "Delayed pulsing for plasma processing of wafers," describes a method, apparatus, and system for processing a wafer in a plasma chamber. This system involves generating plasma by applying RF source power for a specific duration, followed by a delay before applying an RF bias signal to the biasing electrode. This process effectively biases the generated plasma towards the wafer, optimizing the wafer processing.

The second patent, "EUV resist patterning using pulsed plasma," outlines a technique where a coating layer is deposited on a patterned feature of a substrate. This method allows for etching and depositing to occur in a single pulsed plasma process, utilizing pulsed source and bias power signals. These advancements are crucial for improving the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Daksh Agarwal is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role involves developing cutting-edge technologies that enhance wafer processing capabilities. Agarwal's expertise in plasma processing has positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Agarwal has collaborated with talented individuals such as Byungkook Kong and Sangwook Kim. These collaborations have contributed to the advancement of technologies in plasma processing and semiconductor manufacturing.

Conclusion

Daksh Agarwal's innovative work in plasma processing technologies has made a significant impact on the semiconductor industry. His patents reflect a commitment to improving wafer processing techniques, showcasing his expertise and dedication to innovation.