Sangwook Kim

Title: Sangwook Kim - Innovator in EUV Resist Patterning

Introduction

Sangwook Kim is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of extreme ultraviolet (EUV) lithography.

Latest Patents

Sangwook Kim holds a patent for "EUV resist patterning using pulsed plasma." This innovative process involves depositing a coating layer on a patterned feature on a first portion of a substrate. Additionally, a second portion of the substrate outside the patterned feature is etched. The etching and depositing are performed in a single pulsed plasma process using at least one of a pulsed source power signal and a pulsed bias power signal. This patent showcases his expertise in enhancing the efficiency of semiconductor fabrication.

Career Highlights

Sangwook Kim is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in advancing technologies that drive the semiconductor sector forward.

Collaborations

Throughout his career, Sangwook has collaborated with talented individuals such as Abhjeet Bagal and Kyoungjin Lee. These collaborations have contributed to the development of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Sangwook Kim's contributions to EUV resist patterning and his role at Applied Materials, Inc. highlight his importance in the semiconductor industry. His innovative patent and collaborations reflect his commitment to advancing technology in this critical field.