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For the Inventor, By the Inventor

Seoul, South Korea

Byung-Hong Chung

USPTO Granted Patents = 17

Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 138(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2003 - 2004)
  • Hwasung, KR (2015)
  • Seoul, KR (1996 - 2017)

Company Filing History:

goldMedal17 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 1996-2017

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17 patents (USPTO):
1. 9553141 - Semiconductor device having supporter (2017-01-24),
2. 9142558 - Semiconductor device having supporter and method of forming the same (2015-09-22),
3. 8970039 - Integrated circuit devices including electrode support structures and methods of fabricating the same (2015-03-03),
4. 8889560 - Methods of forming fine patterns for semiconductor device (2014-11-18),
5. 8642458 - Method of fabricating nonvolatile memory device (2014-02-04),
6. 7951671 - Method of fabricating non-volatile memory device having separate charge trap patterns (2011-05-31),
7. 7829437 - Method of manufacturing a semiconductor device (2010-11-09),
8. 7745325 - Wiring structure of a semiconductor device, method of forming the wiring structure, non-volatile memory device including the wiring structure, and method of manufacturing the non-volatile memory device (2010-06-29),
9. 7678650 - Nonvolatile memory device and method of manufacturing the same (2010-03-16),
10. 7560768 - Nonvolatile memory device and method of manufacturing the same (2009-07-14),
11. 7250346 - Dual gate oxide structure in semiconductor device and method thereof (2007-07-31),
12. 6914013 - Method of forming semiconductor device containing oxide/nitride/oxide dielectric layer (2005-07-05),
13. 6744096 - Non-volatile memory device having a bit line contact pad and method for manufacturing the same (2004-06-01),
14. 6593190 - Non-volatile memory device having a bit line contact pad and method for manufacturing the same (2003-07-15),
15. 6548374 - Method for self-aligned shallow trench isolation and method of manufacturing non-volatile memory device comprising the same (2003-04-15),

Title: Byung-Hong Chung: Innovator in Semiconductor Technology

Introduction

Byung-Hong Chung is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 17 patents. His work focuses on innovative semiconductor devices that enhance performance and efficiency.

Latest Patents

Among his latest patents is a semiconductor device featuring a supporter. This device includes a plurality of lower electrodes with a vertical length greater than a horizontal width on a substrate. The supporter is strategically placed between the lower electrodes, with an upper electrode positioned on top. Additionally, a capacitor dielectric layer is situated between the lower electrodes and the upper electrode. The supporter comprises a first element, a second element, and oxygen. Notably, the oxide of the second element possesses a higher band gap energy than that of the first element, with the content of the second element in the supporter ranging from about 10 at % to 90 at %.

Another significant patent is the semiconductor device having a supporter and method of forming the same. This patent shares similar features with the previous one, emphasizing the innovative design and functionality of the semiconductor device.

Career Highlights

Byung-Hong Chung is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to the company's reputation for innovation.

Collaborations

Throughout his career, Chung has collaborated with notable colleagues, including Hyun Kyu Park and Bong-jin Kuh. These collaborations have fostered a creative environment that has led to groundbreaking advancements in semiconductor devices.

Conclusion

Byung-Hong Chung's contributions to semiconductor technology are noteworthy, with a solid portfolio of patents that reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements in technology.

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