Byung Ho Nam

This inventor holds 11 USPTO granted patents. Top assignees: Skhynix Inc., Hynix Semiconductor Inc.. Active years: 2008-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung Ho Nam. Retrieved from https://idiyas.com/inventor/byung-ho-nam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 81.8

Average Co-Inventor Count = 1.4

ph-index = 2

Forward Citations = 11(Granted Patents)

Location History:

Daegu-si, KR (2008 - 2013)
Daegu, KR (2011 - 2017)

Company Filing History:

Hynix Semiconductor Inc.

patents

Years Active: 2008-2017

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9841668 - Photomasks for reducing thermal stress generated by heat (2017-12-12),

2. 9664996 - Photomasks for reducing thermal stress generated by heat (2017-05-30),

3. 9599887 - Photo mask including pre-alignment keys and photolithography apparatus performing a pre-alignment process for the photo mask (2017-03-21),

4. 9335625 - Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof (2016-05-10),

5. 9274411 - Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same (2016-03-01),

6. 8906582 - Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof (2014-12-09),

7. 8748065 - Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same (2014-06-10),

8. 8486822 - Semiconductor device having dummy pattern and the method for fabricating the same (2013-07-16),

9. 8021805 - Backside phase grating mask and method for manufacturing the same (2011-09-20),

10. 7902671 - Semiconductor device having dummy pattern and the method for fabricating the same (2011-03-08),

11. 7422830 - Method for detecting failure of database patterns of photo mask (2008-09-09),

Title: Byung Ho Nam: Innovator in Photomask Technology

Introduction

Byung Ho Nam is a prominent inventor based in Daegu, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 11 patents. His innovative work focuses on reducing thermal stress generated by heat in photomasks, which are essential in the semiconductor manufacturing process.

Latest Patents

Nam's latest patents include advanced designs for photomasks aimed at minimizing thermal stress. One of his notable inventions features a photomask that consists of a light transmission substrate with a transfer region and a frame region. This design incorporates a light-transmitting region that exposes a portion of the substrate corresponding to a transfer pattern. Additionally, it includes a phase shift region that surrounds the light-transmitting area, enhancing the photomask's performance. Another patent describes a photomask with a light-blocking region that surrounds the light-transmitting region, further improving the efficiency and effectiveness of the photomask in semiconductor applications.

Career Highlights

Throughout his career, Byung Ho Nam has worked with leading companies in the semiconductor industry, including SK Hynix Inc. and Hynix Semiconductor Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in photomask technology.

Collaborations

Nam has collaborated with several talented individuals in his field, including Yong Dae Kim and Young Mo Lee. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Byung Ho Nam is a distinguished inventor whose work in photomask technology has made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing technology in this critical field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]