The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Apr. 28, 2017
SK Hynix Inc., Icheon, KR;
Byung Ho Nam, Daegu, KR;
SK HYNIX INC., Icheon, KR;
Abstract
A photomask includes a light transmission substrate having a transfer region and a frame region, a light-transmitting region exposing a portion of the light transmission substrate in the transfer region corresponding to a transfer pattern, a phase shift region surrounding the light-transmitting region in the transfer region. The phase shift region includes a first phase shift region surrounding the light-transmitting region and a second phase shift region surrounding the first phase shift region. A first phase shift pattern is disposed on the light transmission substrate in the first phase shift region, and a plurality of second phase shift patterns are disposed on the light transmission substrate in the second phase shift region.