The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Sep. 10, 2015
Applicant:
SK Hynix Inc., Icheon, KR;
Inventor:
Byung Ho Nam, Daegu, KR;
Assignee:
SK HYNIX INC., Icheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/42 (2012.01);
U.S. Cl.
CPC ...
G03F 1/42 (2013.01);
Abstract
A photo mask includes a pre-alignment key used in a pre-alignment process performed in a photolithography apparatus. The pre-alignment key includes a pre-alignment pattern including a light transmitting area and a light blocking area surrounding the pre-alignment pattern. The light blocking area includes a plurality of light blocking patterns and a diffraction grating pattern separating the plurality of light blocking patterns from each other.