Hwaseong, South Korea

Byoung Kwon Choo

This inventor holds 25 USPTO granted patents and 10 published patent applications and 4 EPO patents, primarily in Display Technology. Top assignees: Samsung Display Co., Ltd., Samsung Display Co., Ltd., K. C. Tech Co., Ltd.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byoung Kwon Choo. Retrieved from https://idiyas.com/inventor/byoung-kwon-choo-p6g2x7mx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Yongin-si, KR (2019 - 2021)
  • Hwaseong-si, KR (2016 - 2024)

Company Filing History:


Years Active: 2016-2026

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Areas of Expertise:
Display Device
Manufacturing Method
Polishing Slurry
TFT Array Substrate
Laser Crystallization
Substrate Polishing
Detection Sensor
Passivation Layer
Polarization Module
Laser Annealing
Flexible Display
Substrate Processing
25 patents (USPTO):Explore Patents

Title: Byoung Kwon Choo: Pioneering Innovations in Display Technology

Introduction

Byoung Kwon Choo is a distinguished inventor based in Hwaseong-si, South Korea, known for his significant contributions to the field of display technology. With a remarkable portfolio of 21 patents, he has demonstrated an unwavering commitment to innovation and the advancement of manufacturing processes for display devices.

Latest Patents

Choo's latest patents showcase his expertise in developing cutting-edge materials and methods. One of his notable inventions is a polishing slurry, which comprises varying components: polishing particles ranging from 0.01 wt % to 10 wt %, a dispersing agent (0.005 wt % to 0.1 wt %), an oxide-polishing promoter with a pyridine compound (0.001 wt % to 1 wt %), a nitride-polishing inhibitor that includes amino acids or anionic organic acids (0.05 wt % to 0.1 wt %), all combined with water. This innovative slurry is designed to enhance the manufacturing process of display devices.

In addition, Choo has developed a method for manufacturing a display device that incorporates an active pattern on a base substrate, along with a gate metal pattern that overlaps the active pattern. His designs feature a planarized insulation layer and a source metal pattern positioned on this layer, contributing to improved efficiency and performance in display technology.

Another key patent from Choo outlines the design of a display device featuring a planarization layer covering transistors within a display area on a substrate. It includes an organic light-emitting diode positioned on the planarization layer and a pad electrode located in a non-display area. A sacrificial layer remnants cap the side surface of the pad electrode, demonstrating Choo's innovative approach to layering in display fabrication.

Career Highlights

Choo’s professional journey includes vital roles at leading companies such as Samsung Display Co., Ltd. and K.C. Tech Co., Ltd., where he has honed his skills in the development of advanced display technologies. His work has significantly influenced the efficiency and quality of display manufacturing, placing him at the forefront of innovations in this field.

Collaborations

Throughout his career, Byoung Kwon Choo has collaborated with notable peers, including Joon-Hwa Bae and Woo Jin Cho. These partnerships have enabled the exchange of ideas and expertise, furthering advancements in display technology and patent development.

Conclusion

Byoung Kwon Choo exemplifies the spirit of innovation in the display technology sector. With his impressive array of patents and collaborations, he continues to make substantial contributions to manufacturing processes and product development, setting a benchmark for future inventors seeking to transform technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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