Samsung Display Co., Ltd.

K. C. Tech Co., Ltd.

Ubmaterials Lnc.

Byoung Kwon Choo

Joon-Hwa Bae

Woo Jin Cho

Hyun Jin Cho

Jun Hyuk Cheon

Byung Hoon Kang

Joo Woan Cho

Seung Bae Kang

Joon Hwa Bae

Woojin Cho

Heesung Yang

Bonggu Kang

Byoung Ho Cheong

Kwang Suk Kim

Jeong Kyun Na

Seung Hwan Lee

Woo Yong Sung

Tae Wook Kang

Oleg Prudnikov

Jae Sik Kim

Sung Hwan Choi

Seungbae Kang

Bong Gu Kang

Hee Sung Yang

Jeong Hye Choi

Zi Yeon Yoon

Seung Hwan Kim

Tae Joon Kim

Jeong Min Park

Seung Ho Kim

Gyu In Shim

Jung Gun Nam

Byoungho Cheong

Sanghoon Ahn

Jeong-Hye Choi

Jee-Hyun Lee

Sung Hyeon Park

Kyung Bo Lee

Keun Woo Lee

Jin Hyung Park

Young Ho Jeong

Jun Hyunk Cheon

Woo-Jin Cho

A method of manufacturing a cover window for a display device includes: providing a glass substrate having a bendable area and a flat area; modifying the bendable area by irradiating the glass substrate with a beam; and etching the bendable area to have a thinner thickness than the flat area. The bendable area may have a faster etch rate than the flat area due to the modifying of the bendable area.

Manufacturing method of cover window for flexible display device and manufacturing method of the flexible display device

A method of fabricating a display device includes: preparing a substrate including emission areas and a non-emission area between the emission areas; forming a bank on the non-emission area to a first height; forming light conversion patterns on the emission areas to a height equal to or less than the first height; polishing a surface of a light conversion layer including the bank and the light conversion patterns so that the surface of the light conversion layer is flat; and forming a filler layer on a surface of the substrate on which the light conversion layer is provided. The polishing of the light conversion layer includes planarizing the surface of the light conversion layer so that the bank and the light conversion patterns have a second height through chemical mechanical polishing utilizing a metallic slurry.

Display device and method of fabricating the same

A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

Polishing slurry, method for manufacturing a display device using the same and display device

A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.

Display device and method of manufacturing the same

A method of manufacturing a detection sensor is disclosed. The method includes forming a biometric information sensing layer including a transistor on a base layer, forming an initial optical pattern layer on the biometric information sensing layer, patterning the initial optical pattern layer to form a plurality of transmissive portions spaced apart from each other and having a first zeta potential, coating a light blocking material to form an initial light blocking portion that covers a side surface and an upper surface of the transmissive portions and has a second zeta potential different from the first zeta potential, and polishing the initial light blocking portion such that the upper surface of the transmissive portions is exposed to form a light blocking portion. The initial light blocking portion is polished by the abrasive, which has the first zeta potential, using a pad.

Display device including detection sensor and method of manufacturing the detection sensor

A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.

Display device including passivation layer with surface step and manufacturing method for the same

A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.

Polishing head, substrate processing apparatus including the same and processing method of substrate using the same

A display device includes: a substrate; an inorganic insulating layer disposed on the substrate; a conductor disposed on the inorganic insulating layer; and an organic insulating layer disposed on the conductor, where an opening is defined through the organic insulating layer to expose a part of the upper surface of the conductor, and at least one material selected from a siloxane, a thiol, a phosphate, a disulfide including a sulfur series, and an amine is bonded on the part of the upper surface of the conductor exposed through the opening.

Display device and manufacturing method thereof

A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.

Substrate polishing system and substrate polishing method

A thin-film transistor (TFT) array substrate is provided. The TFT array substrate includes a base substrate, a semiconductor layer disposed on the base substrate, an insulating layer disposed on the semiconductor layer, and a gate electrode disposed on the insulating layer. A top surface of a portion of the insulating layer overlapping the semiconductor layer in a plan view of the base substrate and a top surface of the gate electrode are placed on the same level.

TFT array substrate and display device including the same

In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.

A polarization module and a laser exposure apparatus have a polarization module including a first lens and a second lens that reduce a one-directional length of a cross-section of an incident laser beam having an optical axis. A polarization beam splitter divides the laser beam passing through the first and second lenses into two laser beams that are polarized in different directions with respect to each other. A first prism lens and a second prism lens emit an output laser beam by controlling the two laser beams that are divided by the polarization beam splitter to positions that are symmetrical with respect to the optical axis. At least one half wave plate is disposed between the polarization beam splitter and the first prism lens.

Polarization module and laser apparatus including the same

Growing community of inventors

Hwaseong-si, South Korea

Byoung Kwon Choo