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For the Inventor, By the Inventor

Boise, ID, United States of America

Byeung Chul Kim

This inventor holds 23 USPTO granted patents and 11 published patent applications, primarily in Integrated Circuits. Top assignee: Micron Technology Incorporated. Active years: 2020-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byeung Chul Kim. Retrieved from https://idiyas.com/inventor/byeung-chul-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 27(Granted Patents)


Company Filing History:

goldMedal21 out of 39,222 
 
Micron Technology Incorporated
 patents
where one patent can have more than one assignee

Years Active: 2020-2026

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Areas of Expertise:
Memory Arrays
Charge-Trapping Materials
Microelectronic Devices
Integrated Assemblies
High-K Dielectric Materials
Stack Structures
Dopant Distributions
Isolation Regions
Electronic Systems
Semiconductor Dieves
Charge Migration Impedance
23 patents (USPTO):Explore Patents
1. 12575102 - Merged cavities and buried etch stops for three-dimensional memory arrays (2026-03-10),
2. 12568621 - Memory apparatus and methods including merged process for memory cell pillar and source structure (2026-03-03),
3. 12557289 - Electronic devices comprising adjoining oxide materials and related systems (2026-02-17),
4. 12543543 - Selective cavity merging for isolation regions in a memory die (2026-02-03),
5. 12477730 - Electronic devices comprising segmented high-k dielectric materials and storage node materials, related systems, and methods of forming (2025-11-18),
6. 12156406 - Methods of forming integrated assemblies with improved charge migration impedance (2024-11-26),
7. 12150303 - Integrated assemblies having charge-trapping material arranged in vertically-spaced segments, and methods of forming integrated assemblies (2024-11-19),
8. 12082416 - Integrated assemblies and methods of forming integrated assemblies (2024-09-03),
9. 12052862 - Microelectronic devices including stack structures having air gaps, and related memory devices, electronic systems, and methods (2024-07-30),
10. 11672118 - Electronic devices comprising adjoining oxide materials and related systems (2023-06-06),
11. 11631697 - Integrated assemblies having vertically-extending channel material with alternating regions of different dopant distributions, and methods of forming integrated assemblies (2023-04-18),
12. 11587948 - Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies (2023-02-21),
13. 11557608 - Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies (2023-01-17),
14. 11289501 - Integrated assemblies having vertically-extending channel material with alternating regions of different dopant distributions, and methods of forming integrated assemblies (2022-03-29),
15. 11171153 - Integrated assemblies having improved charge migration (2021-11-09),

Title: The Innovative Journey of Byeung Chul Kim

Introduction: Byeung Chul Kim, a pioneering inventor based in Boise, ID (US), has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Byeung Chul Kim holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: Throughout his illustrious career, Byeung Chul Kim has been recognized for his inventive prowess, receiving numerous awards for his groundbreaking technologies that have revolutionized various industries.

Collaborations: Byeung Chul Kim has collaborated with leading research institutions, universities, and tech companies to further develop and implement his innovative ideas, solidifying his reputation as a visionary inventor.

Conclusion: Byeung Chul Kim's relentless pursuit of innovation and his passion for creating solutions to complex challenges have established him as a trailblazing inventor whose impact will be felt for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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