Pleasanton, CA, United States of America

Bruno M LaFontaine

This inventor holds 21 USPTO granted patents, primarily in EUV Lithography. Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc., Other. Active years: 2003-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruno M LaFontaine. Retrieved from https://idiyas.com/inventor/bruno-m-lafontaine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 71.4

Average Co-Inventor Count = 2.6

ph-index = 8

Forward Citations = 264(Granted Patents)


Company Filing History:


Years Active: 2003-2014

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Areas of Expertise:
Optical Polarizer
Nanotube Array
Laser Beam Formatting
Semiconductor Fabrication
Lithography Mask
EUV Masks
Photoresist
Contamination Detection
Reflective Imaging
Phase-Shifting Mask
Immersion Lithography
Fluorescence Spectroscopy
21 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Bruno M LaFontaine

Introduction

Bruno M LaFontaine is a notable inventor based in Pleasanton, California, with an impressive portfolio of 21 patents. His work primarily focuses on innovations within semiconductor technologies, demonstrating a commitment to enhancing optical and laser-based systems for lithography applications.

Latest Patents

Among his latest contributions, LaFontaine's patent for an **Optical polarizer with nanotube array** stands out. This invention features an optical polarizer intended for use in semiconductor wafer lithography, incorporating an array of aligned nanotubes that convert light into polarized form. A unique aspect of this patent is its capability to control the level of polarization through a voltage source. Additionally, the use of chromogenic materials allows for the manipulation of the transmitted polarized light's wavelength.

Another significant patent is the **Laser beam formatting module and method for fabricating semiconductor dies using same**. This innovative module is designed for lithographic systems, consisting of an aperture plate and a lens assembly, which together produce a consistent laser beam intensity needed for efficient semiconductor wafer fabrication. This technology notably enhances energy conversion efficiency and minimizes unwanted radiation emissions, thus optimizing the laser-produced plasma lithographic process.

Career Highlights

Bruno LaFontaine has contributed his expertise to renowned companies such as Advanced Micro Devices Corporation and GlobalFoundries Inc. His work in these organizations has played a crucial role in advancing semiconductor manufacturing technologies.

Collaborations

Throughout his career, LaFontaine has collaborated with esteemed colleagues including Ivan Lalovic and Harry Jay Levinson. These partnerships illustrate the collaborative effort often necessary in the innovative landscape of semiconductor technology, where diverse expertise converges to create breakthrough solutions.

Conclusion

Bruno M LaFontaine’s extensive patent portfolio and collaborations exemplify his pivotal role in driving innovation within the semiconductor industry. His contributions not only enhance the efficiency of semiconductor manufacturing processes but also pave the way for future advancements in optical and laser technologies. LaFontaine’s continued work promises to influence the evolution of semiconductor applications significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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