The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Sep. 02, 2003
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
Adam R. Pawloski, San Jose, CA (US);
Amr Y. Abdo, Madison, WI (US);
Gilles R. Amblard, San Jose, CA (US);
Bruno M. Lafontaine, Pleasanton, CA (US);
Ivan Lalovic, Mountain View, CA (US);
Harry J. Levinson, Saratoga, CA (US);
Jeffrey A. Schefske, San Jose, CA (US);
Cyrus E. Tabery, Santa Clara, CA (US);
Frank Tsai, Saratoga, CA (US);
Adam R. Pawloski, San Jose, CA (US);
Amr Y. Abdo, Madison, WI (US);
Gilles R. Amblard, San Jose, CA (US);
Bruno M. LaFontaine, Pleasanton, CA (US);
Ivan Lalovic, Mountain View, CA (US);
Harry J. Levinson, Saratoga, CA (US);
Jeffrey A. Schefske, San Jose, CA (US);
Cyrus E. Tabery, Santa Clara, CA (US);
Frank Tsai, Saratoga, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of operating an immersion lithography system, including steps of immersing at least a portion of a wafer to be exposed in an immersion medium, wherein the immersion medium comprises at least one bubble; directing an ultrasonic wave through at least a portion of the immersion medium to disrupt and/or dissipate the at least one bubble; and exposing the wafer with an exposure pattern by passing electromagnetic radiation through the immersion medium subsequent to the directing. Also disclosed is a monitoring and control system for an immersion lithography system.