The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Feb. 21, 2007
Bruno M. Lafontaine, Pleasanton, CA (US);
Ryoung-han Kim, San Jose, CA (US);
Harry J. Levinson, Saratoga, CA (US);
Uzodinma Okoroanyanwu, Northampton, MA (US);
Bruno M. LaFontaine, Pleasanton, CA (US);
Ryoung-Han Kim, San Jose, CA (US);
Harry J. Levinson, Saratoga, CA (US);
Uzodinma Okoroanyanwu, Northampton, MA (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
An optical polarizer positioned before a light source for use in semiconductor wafer lithography including an array of aligned nanotubes. The array of aligned nanotubes cause light emitted from the light source and incident on the array of aligned nanotubes to be converted into polarized light for use in the semiconductor wafer lithography. The amount of polarization can be controlled by a voltage source coupled to the array of aligned nanotubes. Chromogenic material of a light filtering layer can vary the wavelength of the polarized light transmitted through the array of aligned nanotubes.