Mountain View, CA, United States of America

Uzodinma Okoroanyanwu

This inventor holds 35 USPTO granted patents and 1 EPO patent, primarily in Semiconductor Technology. Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc., Spansion LLC.. Active years: 2000-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Uzodinma Okoroanyanwu. Retrieved from https://idiyas.com/inventor/uzodinma-okoroanyanwu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 65.7


Average Co-Inventor Count = 2.7

ph-index = 12

Forward Citations = 874(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2004 - 2008)
  • Mountain View, CA (US) (2000 - 2011)
  • Clifton Park, NY (US) (2011)
  • Northampton, MA (US) (2010 - 2015)

Company Filing History:


Years Active: 2000-2015

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Areas of Expertise:
Photoresist
Semiconductor Wafer
Lithography
Memory Devices
Pattern Formation
EUV Pellicle
Organic Electronics
Dielectric Materials
Nanotube Array
Critical Dimensions
Anodic Sulfide Passivation
Integrated Circuits
35 patents (USPTO):Explore Patents

Title: Uzodinma Okoroanyanwu: A Trailblazer in Semiconductor Innovations

Introduction:

Uzodinma Okoroanyanwu, a respected inventor based in Mountain View, California, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 35 patents and a focus on the development of lithography mask structures and photoresist patterning methods, Okoroanyanwu has played a pivotal role in advancing the capabilities of semiconductor manufacturing processes.

Latest Patents:

Among Uzodinma Okoroanyanwu's recent patents, two notable inventions stand out. The first patent revolves around a lithography mask structure designed for the precise manufacturing of semiconductors. By incorporating reflective layers, absorber film stacks, and specific material combinations, Okoroanyanwu has successfully created structures that enhance efficiency and reduce the reflectivity of EUV light, a crucial requirement in semiconductor fabrication.

The second patent outlines a novel method for forming photoresist patterns on semiconductor wafers. Okoroanyanwu's technique involves the precise application of an oxidizing reagent, catalyzing the pattern formation process and ensuring high pattern fidelity. By combining this approach with baking and exposure steps, he has significantly improved the efficiency and accuracy of photoresist patterning.

Career Highlights:

Throughout his distinguished career, Uzodinma Okoroanyanwu has held roles at renowned companies in the semiconductor industry, including Advanced Micro Devices Corporation (AMD) and GlobalFoundries Inc. His experience and expertise have positioned him as a prominent figure in the field, recognized for his contributions to cutting-edge semiconductor technologies.

Collaborations:

Okoroanyanwu has had the privilege of collaborating with esteemed individuals in the industry, including Nicholas H Tripsas and Suzette Keefe Pangrle. These partnerships have enabled knowledge sharing, fostered innovation, and pushed the boundaries of semiconductor manufacturing.

Conclusion:

Uzodinma Okoroanyanwu's numerous patents and innovative contributions in the realm of semiconductor technology have undoubtedly left an indelible mark. His work has not only advanced the field but also paved the way for more efficient and effective manufacturing processes. With a continued emphasis on research and development, Okoroanyanwu is a visionary driving advancements within the semiconductor industry, benefiting both companies and consumers alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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