The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2006

Filed:

Dec. 03, 2003
Applicants:

Uzodinma Okoroanyanwu, Mountain View, CA (US);

Nicolay F. Yudanov, Brookline, MA (US);

Inventors:

Uzodinma Okoroanyanwu, Mountain View, CA (US);

Nicolay F. Yudanov, Brookline, MA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and systems are provided for patterning a non conductive dielectric on a surface of a conductive polymer. The conductive polymer can be part of an organic memory cell. Hydrogen ions created form molecular hydrogen being exposed to short wave length radiation, are employed as mobile positive ion charge carriers to create a non-conductive die-electric pattern on a conductive and/or semiconductive polymer surface of the organic memory cell. Such process reduces number of masking steps performed. In addition, the process is scalable with lithographic wave length and can be performed on wide spread tool sets and photoresist material available in commercial market.


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