Campbell, CA, United States of America

Barry Blasenheim


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2019-2022

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6 patents (USPTO):Explore Patents

Title: The Innovations of Barry Blasenheim

Introduction

Barry Blasenheim is a notable inventor based in Campbell, California. He has made significant contributions to the field of semiconductor metrology, holding a total of 6 patents. His work focuses on improving measurement techniques and systems that enhance the accuracy and efficiency of wafer orientation and analysis.

Latest Patents

One of Barry's latest patents is titled "Measurement and control of wafer tilt for x-ray based metrology." This patent describes methods and systems for measuring the orientation of a wafer at or near an X-ray scatterometry measurement location. The X-ray scatterometry based metrology system includes a wafer orientation measurement system that can measure wafer orientation based on a single measurement without requiring intervening stage moves. In some embodiments, the orientation measurement spot coincides with the X-ray measurement spot, allowing for simultaneous measurements. Additionally, the patent discusses filtering signals detected by the wafer orientation measurement system to improve tracking and calibrating the system to identify the wafer's orientation concerning an incident X-ray beam.

Another significant patent is the "Variable aperture mask." This invention involves a collection system for a semiconductor metrology tool that includes a chuck to support a target from which an optical beam is reflected. The system features a spectrometer to receive the reflected optical beam and a plurality of aperture masks arranged in a rotatable sequence. Each mask can be rotated into and out of the reflected optical beam to selectively mask it, enhancing the measurement process.

Career Highlights

Barry has worked with prominent companies in the semiconductor industry, including KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in metrology technology.

Collaborations

Throughout his career, Barry has collaborated with talented individuals such as Noam Sapiens and Michael Friedmann. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Barry Blasenheim's contributions to semiconductor metrology through his innovative patents and collaborations have significantly impacted the industry. His work continues to influence the way wafer measurements are conducted, showcasing the importance of innovation in technology.

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