The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

May. 12, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Barry Blasenheim, Campbell, CA (US);

Noam Sapiens, Cupertino, CA (US);

Michael Friedmann, Mountain View, CA (US);

Pablo Rovira, Santa Clara, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01J 3/02 (2006.01); G01J 4/00 (2006.01); G02B 27/28 (2006.01); G02B 27/30 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01J 3/0229 (2013.01); G01J 3/0237 (2013.01); G01J 4/00 (2013.01); G02B 27/28 (2013.01); G02B 27/30 (2013.01); G01N 2021/213 (2013.01);
Abstract

A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.


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