Santa Clara, CA, United States of America

Pablo Rovira


Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2018 - 2022)
  • Milpitas, CA (US) (2023)

Company Filing History:


Years Active: 2018-2023

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Pablo Rovira

Introduction

Pablo Rovira, an accomplished inventor based in Santa Clara, CA, has made significant contributions to the field of semiconductor metrology. With a remarkable portfolio of four patents, his work continues to push the boundaries of innovation in high-volume production process monitoring.

Latest Patents

Among Rovira's latest patents is a groundbreaking invention titled "Loosely-coupled inspection and metrology system for high-volume production process monitoring." This inventive metrology system comprises a controller that is communicatively coupled to both a reference metrology tool and an optical metrology tool. It utilizes one or more processors to generate a geometric model that determines the profile of test HAR structures from metrology data. Additionally, it creates a material model for determining material parameters of a test HAR structure based on optical metrology tool data. By forming a composite model and leveraging these advanced tools, Rovira's system provides precise measurements for additional test HAR structures.

Another of his notable inventions is the "Variable aperture mask." This patent outlines a collection system for a semiconductor metrology tool featuring a chuck that supports targets for optical beam reflection. The system includes a spectrometer that receives the reflected beam, complemented by multiple rotatable aperture masks that selectively mask the optical beam. This innovative design enhances the measurement accuracy in semiconductor applications.

Career Highlights

Pablo Rovira has built his career with a focus on technology and innovation, significantly advancing the semiconductor industry. He has worked with reputable companies, including KLA Corporation and KLA-Tencor Corp, where he honed his expertise in metrology and inspection systems. His contributions have not only pushed the boundaries of technology but have also established him as a key player in the field.

Collaborations

Throughout his career, Rovira has collaborated with esteemed colleagues, including Andrei V. Shchegrov and Jonathan M. Madsen. These partnerships reflect his commitment to teamwork and advancement in technology, as they have jointly worked on pioneering solutions that benefit the semiconductor sector.

Conclusion

In conclusion, Pablo Rovira's dedication to innovation is evident through his patented inventions and career within the semiconductor industry. His work continues to inspire future developments in metrology and production processes, solidifying his reputation as a leading inventor. As technology progresses, Rovira's contributions will undoubtedly leave a lasting impact on the field of semiconductor metrology.

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