The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Aug. 06, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Barry Blasenheim, Campbell, CA (US);
Noam Sapiens, Cupertino, CA (US);
Michael Friedmann, Mountain View, CA (US);
Pablo Rovira, Santa Clara, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01J 3/02 (2006.01); G01J 4/00 (2006.01); G02B 27/28 (2006.01); G02B 27/30 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01J 3/0229 (2013.01); G01J 3/0237 (2013.01); G01J 4/00 (2013.01); G02B 27/28 (2013.01); G02B 27/30 (2013.01); G01N 2021/213 (2013.01);
Abstract
In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.