Asahi Nomoto

Title: The Innovative Contributions of Asahi Nomoto

Introduction

Asahi Nomoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials processing, particularly in the development of methods for wafer separation and ingot processing. With a total of four patents to his name, Nomoto's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Nomoto's latest patents include a processing method and apparatus for ingots. This innovative method involves applying exciting light to an ingot and detecting the resulting fluorescence from its upper surface. The distribution of photon counts from the fluorescence is stored as two-dimensional data, which is associated with XY coordinate positions. Additionally, a Z-coordinate position is recorded, allowing for a comprehensive understanding of the ingot's properties. Another notable patent is the separation method of wafers, which describes a technique for dividing a wafer into two parts. This method utilizes a laser beam to create a separation origin within the wafer, enabling precise division through an external force.

Career Highlights

Throughout his career, Asahi Nomoto has worked with notable companies such as Disco Corporation and Denso Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor industry.

Collaborations

Nomoto has collaborated with talented individuals in his field, including Kazuya Hirata and Masatake Nagaya. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Asahi Nomoto's contributions to the field of materials processing and semiconductor manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical industry. His work continues to influence the future of wafer processing and ingot technology.