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For the Inventor, By the Inventor

Orlando, FL, United States of America

Arun Kumar Nanda

This inventor holds 29 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Agere Systems Inc., Lucent Technologies Inc., Agere Systems Guardian Corp.. Active years: 1992-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arun Kumar Nanda. Retrieved from https://idiyas.com/inventor/arun-kumar-nanda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29

% Patents Active = 79.3

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 201(Granted Patents)


Location History:

  • Austin, TX (US) (1996 - 2000)
  • Bethlehem, PA (US) (1992 - 2001)
  • Orlando, FL (US) (2000 - 2011)
  • Singapore, SG (2006 - 2011)

Company Filing History:

goldMedal11 out of 2,316 
 
Agere Systems Inc.
 patents
silverMedal10 out of 9,364 
 
Lucent Technologies Inc.
 patents
bronzeMedal3 out of 598 
 
Agere Systems Guardian Corp.
 patents
4. 3 out of 4,208 
 
At+t Corp.
 patents
5. 2 out of 3,345 
 
At&t Bell Laboratories
 patents

Years Active: 1992-2011

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Areas of Expertise:
Bipolar Junction Transistor
Shallow Trench Isolation
BiCMOS Fabrication
Wafer Warpage Control
Chemical-Mechanical Polishing
Polishing Head
Tungsten Formation
Integrated Circuit Fabrication
Multilayered Structure
Barrier Layer Treatments
Dishing Reduction
Silicon Dioxide Material
29 patents (USPTO):Explore Patents
1. 8084313 - Method for forming a bipolar junction transistor and a metal oxide semiconductor field effect transistor (2011-12-27),
2. 8022481 - Robust shallow trench isolation structures and a method for forming shallow trench isolation structures (2011-09-20),
3. 7906407 - Shallow trench isolation structures and a method for forming shallow trench isolation structures (2011-03-15),
4. 7776678 - Thermally stable BiCMOS fabrication method and bipolar junction transistors formed according to the method (2010-08-17),
5. 7514336 - Robust shallow trench isolation structures and a method for forming shallow trench isolation structures (2009-04-07),
6. 7439119 - Thermally stable BiCMOS fabrication method and bipolar junction transistors formed according to the method (2008-10-21),
7. 7279393 - Trench isolation structure and method of manufacture therefor (2007-10-09),
8. 7247556 - Control of wafer warpage during backend processing (2007-07-24),
9. 7141486 - Shallow trench isolation structures comprising a graded doped sacrificial silicon dioxide material and a method for forming shallow trench isolation structures (2006-11-28),
10. 6702654 - Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof (2004-03-09),
11. 6648734 - Polishing head for pressurized delivery of slurry (2003-11-18),
12. 6500729 - Method for reducing dishing related issues during the formation of shallow trench isolation structures (2002-12-31),
13. 6436829 - Two phase chemical/mechanical polishing process for tungsten layers (2002-08-20),
14. 6358785 - Method for forming shallow trench isolation structures (2002-03-19),
15. 6323126 - Tungsten formation process (2001-11-27),

Title: The Innovative Journey of Arun Kumar Nanda

Introduction: Arun Kumar Nanda, a talented inventor based in Orlando, FL, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Arun Kumar Nanda holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise.

Career Highlights: With a background in engineering and a passion for problem-solving, Arun Kumar Nanda has successfully brought several inventions from concept to market, revolutionizing industries along the way.

Collaborations: Throughout his career, Arun Kumar Nanda has collaborated with leading research institutions, universities, and tech companies to further develop his inventions and bring them to the forefront of innovation.

Conclusion: Arun Kumar Nanda's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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