Location History:
- Austin, TX (US) (1998)
- Dallas, TX (US) (1998 - 1999)
- Cupertino, CA (US) (1999 - 2009)
Company Filing History:
11 out of 13,741 
1 out of 641 
Years Active: 1998-2009
Title: Arik Donde: Innovator in Substrate Processing Technologies
Introduction
Arik Donde is a prominent inventor based in Cupertino, California, known for his significant contributions to substrate processing technologies. With a total of 12 patents to his name, Donde has made remarkable advancements in the field, particularly in temperature stabilization and electrostatic chuck designs.
Latest Patents
One of Donde's latest patents is focused on temperature stabilization for substrate processing. This invention discloses a temperature stabilization system, method, composition of matter, and substrate processing system. It features a heat-absorbing material that is in thermal contact with a substrate. The material is characterized by a solid-liquid phase transition temperature that falls within a desired range for processing the substrate. This innovation ensures that when the substrate undergoes material processing, the solid-liquid phase transition of the heat-absorbing material effectively stabilizes the substrate's temperature.
Another notable patent is for an electrostatic chuck that includes a composite dielectric layer and a method of manufacture. This electrostatic chuck is designed with an electrode that can be electrically charged to hold a substrate electrostatically. The composite layer consists of a first dielectric material covering the central portion of the electrode and a second dielectric material covering the peripheral portion, with differing compositions. This chuck is particularly useful in plasma process chambers for processing substrates, such as semiconductor wafers.
Career Highlights
Throughout his career, Arik Donde has worked with leading companies in the technology sector, including Applied Materials, Inc. and KLA-Tencor Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in substrate processing.
Collaborations
Donde has collaborated with notable professionals in the field, including Edwin Charles Weldon and Brian C. Lue. These collaborations have further enhanced his work and led to the development of cutting-edge technologies.
Conclusion
Arik Donde's contributions to substrate processing technologies through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in material processing and semiconductor technology.