The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 1998

Filed:

Apr. 26, 1996
Applicant:
Inventors:

Arik Donde, Dallas, TX (US);

Dan Maydan, Los Altos Hills, CA (US);

Robert J Steger, Cupertino, CA (US);

Edwin C Weldon, Los Gatos, CA (US);

Brian Lue, Mountain View, CA (US);

Timothy Dyer, Tempe, AZ (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118500 ; 118715 ; 1187 / ; 118725 ; 118728 ; 156345 ; 295921 ; 29428 ; 29458 ;
Abstract

The present invention discloses a two basic structures (including multiple variations within one of the basic structures) and methods for fabrication of the structures which facilitate the flow of cooling gas or other heat transfer fluid to the surface of an electrostatic chuck. The basic structures address both the problem of breakdown of a heat transfer gas in an RF plasma environment and the problem of arcing between a semiconductor substrate and the conductive pedestal portion of the electrostatic chuck in such an RF plasma environment.


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