The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Nov. 06, 1997
Edwin C Weldon, Los Gatos, CA (US);
Kenneth S Collins, San Jose, CA (US);
Arik Donde, Cupertino, CA (US);
Brian Lue, Mountain View, CA (US);
Dan Maydan, Los Altos Hills, CA (US);
Robert J Steger, Cupertino, CA (US);
Timothy Dyer, Tempe, AZ (US);
Ananda H Kumar, Milpitas, CA (US);
Alexander M Veytser, Mountain View, CA (US);
Kadthala R Narendrnath, San Jose, CA (US);
Semyon L Kats, San Francisco, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Shamouil Shamouilian, San Jose, CA (US);
Dennis S Grimard, Ann Arbor, MI (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises a dielectric covered electrode 110 having at least one heat transfer gas flow conduit 150 therein. An electrical isolator 200 comprising dielectric material is positioned in the gas flow conduit 150 to (i) electrically isolate the gas in the conduit from the plasma or electrode 110, and (ii) allow passage of heat transfer gas through the conduit. Preferably, the dielectric material comprises a plasma-deactivating material that has a high surface area that reduces plasma formation of gas passing through the conduit 150 in a plasma process. A semiconducting dielectric member 115 useful for rapidly charging and discharging electrostatic chucks is also described.