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For the Inventor, By the Inventor

Vantaa, Finland

Antti H Rahtu

This inventor holds 21 USPTO granted patents and 1 published patent application, primarily in Atomic Layer Deposition. Top assignees: Asm International N.v., Asm IP Holding B.v., Asm Microchemistry Oy. Active years: 2003-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Antti H Rahtu. Retrieved from https://idiyas.com/inventor/antti-h-rahtu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 343(Granted Patents)


Location History:

  • Espoo, FI (2003 - 2005)
  • FIN-02140 Espoo, FI (2008)
  • Helsinki, FI (2013 - 2017)
  • Vantaa, FI (2010 - 2021)

Company Filing History:

goldMedal12 out of 313 
 
Asm International N.v.
 patents
silverMedal6 out of 1,318 
 
Asm IP Holding B.v.
 patents
bronzeMedal1 out of 19 
 
Asm Microchemistry Oy
 patents
4. 2 out of 834,513 
Other
 patents

Years Active: 2003-2021

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Areas of Expertise:
Atomic Layer Deposition
Thin Film Deposition
Metal-Containing Films
Hafnium Films
Zirconium Films
Noble Metals
CVD Techniques
Oxide Films
Cyclopentadienyl Compounds
Enhanced Deposition
Germanium Films
21 patents (USPTO):Explore Patents
1. 11155919 - ALD of metal-containing films using cyclopentadienyl compounds (2021-10-26),
2. 10964534 - Enhanced thin film deposition (2021-03-30),
3. 10297444 - Enhanced thin film deposition (2019-05-21),
4. 10294563 - ALD of hafnium-containing films using cyclopentadienyl compounds (2019-05-21),
5. 9850575 - ALD of metal-containing films using cyclopentadienly compounds (2017-12-26),
6. 9831094 - Enhanced thin film deposition (2017-11-28),
7. 9677175 - ALD of metal-containing films using cyclopentadienyl compounds (2017-06-13),
8. 9670582 - ALD of metal-containing films using cyclopentadienyl compounds (2017-06-06),
9. 9587307 - Enhanced deposition of noble metals (2017-03-07),
10. 9273391 - ALD of zirconium-containing films using cyclopentadienyl compounds (2016-03-01),
11. 9127351 - Enhanced thin film deposition (2015-09-08),
12. 8993055 - Enhanced thin film deposition (2015-03-31),
13. 8795771 - ALD of metal-containing films using cyclopentadienyl compounds (2014-08-05),
14. 8685165 - Metal oxide films (2014-04-01),
15. 8501275 - Enhanced deposition of noble metals (2013-08-06),

Title: Antti H Rahtu - Pioneering Finnish Inventor

Introduction: Antti H Rahtu is a distinguished inventor hailing from Vantaa, Finland, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Antti H Rahtu holds several patents in various technological domains, showcasing his versatility and ingenuity in creating novel solutions to complex problems.

Career Highlights: Throughout his illustrious career, Antti H Rahtu has consistently pushed the boundaries of technological advancement, with a keen focus on developing practical and impactful inventions that have the potential to revolutionize industries.

Collaborations: Antti H Rahtu has collaborated with leading research institutions, universities, and innovative companies to bring his ideas to life, fostering a culture of innovation and excellence in all his projects.

Conclusion: Antti H Rahtu's relentless pursuit of innovation and his passion for creating transformative inventions have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the limits of what is possible in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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