Austin, TX, United States of America

Anthony John Toprac



Average Co-Inventor Count = 2.2

ph-index = 25

Forward Citations = 2,122(Granted Patents)

Forward Citations (Not Self Cited) = 2,113(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1998-2007

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Areas of Expertise:
Photolithography
Semiconductor Manufacturing
Process Control
Data Compression
Critical Dimensions
Chemical Mechanical Polishing
Wafer Uniformity
Run-to-Run Control
Statistical Process Control
Tool Maintenance
Optical Emission Spectra
Dynamic Control Models
77 patents (USPTO):Explore Patents

Title: The Innovative Mind of Anthony John Toprac

Introduction

Anthony John Toprac is a prominent inventor based in Austin, TX, recognized for his impressive portfolio of 77 patents. His inventive contributions have significantly advanced the field of microelectronics, particularly in the domains of photolithography and semiconductor fabrication.

Latest Patents

Toprac's latest patents showcase his expertise and innovative approach in microelectronic fabrication. One of his notable inventions is a "Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication". This method involves processing a workpiece in a defined processing step, measuring the characteristic parameters of the process, and forming an output signal that correlates with the measured data. This allows for setting target values for the processing outcome based on real-time data.

Another significant achievement is the "Run to run control process for controlling critical dimensions". This patent addresses the variability in critical dimensions during semiconductor fabrication by introducing a control method that adjusts the time of photoresist etch as a manipulated variable. This innovative approach minimizes lot-to-lot variation, increases yield, and enhances the speed of circuit fabrication, particularly benefiting polysilicon gate critical dimension control in microprocessor circuits. The run-to-run control technique effectively drives critical dimensions of integrated circuits to meet specified targets, utilizing feedback and feedforward control methodologies.

Career Highlights

Throughout his career, Toprac has made considerable contributions while working with various companies, including Advanced Micro Devices Corporation. His experience in such high-profile organizations has enabled him to refine his skills in microelectronic processes and solidify his reputation as an influential inventor in the field.

Collaborations

Anthony John Toprac has collaborated with other esteemed professionals, including Christopher Allen Bode and Alexander James Pasadyn. These partnerships have played a vital role in fostering innovation and advancing technology in their respective domains.

Conclusion

In summary, Anthony John Toprac is a distinguished inventor with a remarkable body of work that continues to impact the microelectronics sector. With his innovative patents and collaborative efforts, Toprac exemplifies the spirit of invention that drives progress in technology and engineering.

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