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For the Inventor, By the Inventor

Austin, TX, United States of America

Anthony John Toprac

This inventor holds 77 USPTO granted patents and 1 EPO patent, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Advanced Micro Devices Corporation, Sematech, Inc., Yield Dynamics, Inc.. Active years: 1998-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthony John Toprac. Retrieved from https://idiyas.com/inventor/anthony-john-toprac

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 77

% Patents Active = 90.9


Average Co-Inventor Count = 2.2

ph-index = 25

Forward Citations = 2,129(Granted Patents)

Forward Citations (Not Self Cited) = 2,113(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal74 out of 13,175 
 
Advanced Micro Devices Corporation
 patents
silverMedal1 out of 97 
 
Sematech, Inc.
 patents
bronzeMedal1 out of 4 
 
Yield Dynamics, Inc.
 patents
4. 1 out of 834,570 
Other
 patents

Years Active: 1998-2007

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Areas of Expertise:
Photolithography
Process Control
Critical Dimensions
Wafer Uniformity
Chemical Mechanical Polishing
Run-to-Run Control
Data Compression
Tool Maintenance
Statistical Process Control
Overlay Registration
Ambient Conditions
Sensor Integration
77 patents (USPTO):Explore Patents
1. 7200459 - Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication (2007-04-03),
2. RE39518 - Run to run control process for controlling critical dimensions (2007-03-12),
3. 7181354 - Method and apparatus for data stackification for run-to-run control (2007-02-20),
4. 7103439 - Method and apparatus for initializing tool controllers based on tool event data (2006-09-05),
5. 6988017 - Adaptive sampling method for improved control in semiconductor manufacturing (2006-01-17),
6. 6970757 - Method and apparatus for updating control state variables of a process control model based on rework data (2005-11-29),
7. 6937914 - Method and apparatus for controlling process target values based on manufacturing metrics (2005-08-30),
8. 6901340 - Method and apparatus for distinguishing between sources of process variation (2005-05-31),
9. 6884147 - Method for chemical-mechanical polish control in semiconductor manufacturing (2005-04-26),
10. 6802045 - Method and apparatus for incorporating control simulation environment (2004-10-05),
11. 6801817 - Method and apparatus for integrating multiple process controllers (2004-10-05),
12. 6789052 - Method of using control models for data compression (2004-09-07),
13. 6785586 - Method and apparatus for adaptively scheduling tool maintenance (2004-08-31),
14. 6784001 - Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same (2004-08-31),
15. 6746958 - Method of controlling the duration of an endpoint polishing process in a multistage polishing process (2004-06-08),

Title: The Innovative Mind of Anthony John Toprac

Introduction

Anthony John Toprac is a prominent inventor based in Austin, TX, recognized for his impressive portfolio of 77 patents. His inventive contributions have significantly advanced the field of microelectronics, particularly in the domains of photolithography and semiconductor fabrication.

Latest Patents

Toprac's latest patents showcase his expertise and innovative approach in microelectronic fabrication. One of his notable inventions is a "Method for determining optimal photolithography overlay targets based on process performance and yield in microelectronic fabrication". This method involves processing a workpiece in a defined processing step, measuring the characteristic parameters of the process, and forming an output signal that correlates with the measured data. This allows for setting target values for the processing outcome based on real-time data.

Another significant achievement is the "Run to run control process for controlling critical dimensions". This patent addresses the variability in critical dimensions during semiconductor fabrication by introducing a control method that adjusts the time of photoresist etch as a manipulated variable. This innovative approach minimizes lot-to-lot variation, increases yield, and enhances the speed of circuit fabrication, particularly benefiting polysilicon gate critical dimension control in microprocessor circuits. The run-to-run control technique effectively drives critical dimensions of integrated circuits to meet specified targets, utilizing feedback and feedforward control methodologies.

Career Highlights

Throughout his career, Toprac has made considerable contributions while working with various companies, including Advanced Micro Devices Corporation. His experience in such high-profile organizations has enabled him to refine his skills in microelectronic processes and solidify his reputation as an influential inventor in the field.

Collaborations

Anthony John Toprac has collaborated with other esteemed professionals, including Christopher Allen Bode and Alexander James Pasadyn. These partnerships have played a vital role in fostering innovation and advancing technology in their respective domains.

Conclusion

In summary, Anthony John Toprac is a distinguished inventor with a remarkable body of work that continues to impact the microelectronics sector. With his innovative patents and collaborative efforts, Toprac exemplifies the spirit of invention that drives progress in technology and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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