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For the Inventor, By the Inventor

Ludwigshafen, Germany

Andrei Honciuc

This inventor holds 5 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Basf Se Corporation, Bafs Se. Active years: 2015-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrei Honciuc. Retrieved from https://idiyas.com/inventor/andrei-honciuc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Wädenswil, CH (2018)
  • Ludwigshafen, DE (2015 - 2019)
  • Waedenswil, CH (2020)

Company Filing History:

goldMedal4 out of 5,903 
 
Basf Se Corporation
 patents
silverMedal1 out of 2 
 
Bafs Se
 patents

Years Active: 2015-2020

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5 patents (USPTO):Explore Patents
1. 10538724 - Defect reduction rinse solution containing ammonium salts of sulfoesters (2020-01-21),
2. 10385295 - Compositions for anti pattern collapse treatment comprising gemini additives (2019-08-20),
3. 9891520 - Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning (2018-02-13),
4. 9557652 - Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below (2017-01-31),
5. 9184057 - Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less (2015-11-10),

Title: Andrei Honciuc: Innovator in Semiconductor Cleaning Solutions

Introduction

Andrei Honciuc is a notable inventor based in Ludwigshafen, Germany. He has made significant contributions to the field of semiconductor cleaning solutions, holding a total of 5 patents. His work focuses on innovative compositions and methods that enhance the cleaning processes in semiconductor manufacturing.

Latest Patents

One of Honciuc's latest patents is titled "Defect reduction rinse solution containing ammonium salts of sulfoesters." This invention relates to a composition that includes one or more ammonium salts derived from various compounds, aimed at cleaning or rinsing products with patterned material layers. The invention also details a method for producing a cleaned product with specific line-space structures. Another significant patent is for "Compositions for anti pattern collapse treatment comprising gemini additives." This method involves rinsing a semiconductor substrate with an aqueous composition containing a gemini additive to reduce defects after the development of a photoresist or photolithographic mask.

Career Highlights

Throughout his career, Andrei Honciuc has worked with prominent companies such as BASF SE Corporation and BAFS SE. His experience in these organizations has allowed him to develop and refine his innovative approaches to semiconductor cleaning.

Collaborations

Honciuc has collaborated with notable colleagues, including Andreas Klipp and Christian Bittner. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Andrei Honciuc's contributions to the field of semiconductor cleaning solutions demonstrate his innovative spirit and dedication to improving manufacturing processes. His patents reflect a commitment to addressing industry challenges through effective and efficient solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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