The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Jul. 08, 2014
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Assignee:
BASF SE, Ludwigshafen am Rhein, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/82 (2012.01); G03F 1/68 (2012.01); G03F 1/24 (2012.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C11D 1/00 (2006.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); C11D 1/004 (2013.01); G03F 1/24 (2013.01); G03F 1/68 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 1/22 (2013.01);
Abstract
In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.
Klipp, Andreas. (2018). Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning (U.S. Patent No. 9891520). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9891520
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile