The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Jul. 01, 2013
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Andreas Klipp, Lambsheim, DE;
Andrei Honciuc, Ludwigshafen, DE;
Guenter Oetter, Frankenthal, DE;
Christian Bittner, Bensheim, DE;
Assignee:
BASF SE, Ludwigshafen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/62 (2006.01); C11D 11/00 (2006.01); C11D 1/40 (2006.01); C11D 1/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 1/008 (2013.01); C11D 1/40 (2013.01); C11D 1/62 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/40 (2013.01);
Abstract
A method of reducing defects of a semiconductor substrate whereby the substrate is rinsed with an aqueous composition containing a gemini additive of the general formula I after the development of a photoresist or a photolithographic mask