The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Feb. 29, 2012
Andreas Klipp, Lambsheim, DE;
Guenter Oetter, Frankenthal, DE;
Sabrina Montero Pancera, Viernheim, DE;
Andrei Honciuc, Ludwigshafen, DE;
Christian Bittner, Bensheim, DE;
Andreas Klipp, Lambsheim, DE;
Guenter Oetter, Frankenthal, DE;
Sabrina Montero Pancera, Viernheim, DE;
Andrei Honciuc, Ludwigshafen, DE;
Christian Bittner, Bensheim, DE;
BASF SE, Ludwigshafen, DE;
Abstract
A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.