Munich, Germany

Andreas Haertl


Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Ottobrunn, DE (2019)
  • Munich, DE (2016 - 2020)

Company Filing History:


Years Active: 2016-2020

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: The Innovative Contributions of Andreas Haertl

Introduction

Andreas Haertl is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on methods for processing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Among his latest patents, one notable invention is a method for processing a semiconductor device. This method involves depositing a first metallization material over a semiconductor body, followed by a heating process that forms a eutectic region within the semiconductor body. Additionally, he has developed a method of manufacturing a semiconductor device with an undulated profile of net doping in a drift zone. This innovative approach includes multiple irradiations with protons and the generation of hydrogen-related donors through annealing, resulting in a complex doping profile.

Career Highlights

Andreas Haertl is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His expertise and innovative methods have contributed to advancements in the industry, enhancing the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Haertl has collaborated with talented individuals such as Daniel Schloegl and Francisco Javier Santos Rodriguez. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Andreas Haertl's contributions to semiconductor technology exemplify the spirit of innovation. His patents and collaborative efforts continue to shape the future of electronics, making him a key figure in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…