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Mountain View, CA, United States of America

Andreas Goebel

This inventor holds 40 USPTO granted patents and 10 published patent applications, primarily in Semiconductor Technology. Top assignees: Acorn Semi, LLC, Acorn Technologies, Inc., Applied Materials, Inc.. Active years: 2005-2025.

USPTO Granted Patents = 40 (Patent Applications = 10)

% Patents Active = 80.0

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 157(Granted Patents)

Location History:

Summit, NJ (US) (2005)
Palo Alto, CA (US) (2016 - 2023)
Mountain View, CA (US) (2009 - 2024)

Company Filing History:

Acorn Technologies, Inc.

patents

5 out of 14,391

Applied Materials, Inc.

patents

4. 1 out of 4

Acorn Technology, Inc.

patents

5. 1 out of 1

Applied Amterials, Inc.

patent

6. 1 out of 4

Applied Matrials, Inc.

patents

7. 1 out of 834,307

Other

patents

Years Active: 2005-2025

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Areas of Expertise:

Nanowire Transistor

SOI Wafers

Tensile Strained Devices

Photon Emission

Optical Modulators

Metal Contacts

Group IV Semiconductors

MIS Contact Structure

Integrated Photonics

3D Patterning

Optical Assemblies

Film Thickness Measurement

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12477776 - Nanowire transistor with source and drain induced by electrical contacts with negative Schottky barrier height (2025-11-18),

2. 12402365 - SOI wafers and devices with buried stressors (2025-08-26),

3. 12336263 - Metal contacts to group IV semiconductors by inserting interfacial atomic monolayers (2025-06-17),

4. 12034078 - Nanowire transistor with source and drain induced by electrical contacts with negative Schottky barrier height (2024-07-09),

5. 11843040 - MIS contact structure with metal oxide conductor (2023-12-12),

6. 11804533 - Metal contacts to group IV semiconductors by inserting interfacial atomic monolayers (2023-10-31),

7. 11791411 - Relating to SOI wafers and devices with buried stressors (2023-10-17),

8. 11728624 - Tensile strained semiconductor photon emission and detection devices and integrated photonics system (2023-08-15),

9. 11610974 - Metal contacts to group IV semiconductors by inserting interfacial atomic monolayers (2023-03-21),

10. 11462643 - Nanowire transistor with source and drain induced by electrical contacts with negative Schottky barrier height (2022-10-04),

11. 11322615 - SOI wafers and devices with buried stressor (2022-05-03),

12. 11271370 - Tensile strained semiconductor photon emission and detection devices and integrated photonics system (2022-03-08),

13. 10879366 - Metal contacts to group IV semiconductors by inserting interfacial atomic monolayers (2020-12-29),

14. 10872964 - MIS contact structure with metal oxide conductor (2020-12-22),

15. 10833199 - Nanowire transistor with source and drain induced by electrical contacts with negative Schottky barrier height (2020-11-10),

Title: The Innovative Journey of Andreas Goebel

Introduction: Andreas Goebel, a visionary inventor based in Mountain View, CA, has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Andreas Goebel's latest patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles and a revolutionary wearable device for monitoring health metrics in real-time.

Career Highlights: With a background in computer science and engineering, Andreas Goebel has a successful track record of developing innovative solutions for complex technological challenges. He has worked for leading tech companies, where he spearheaded projects that have pushed the boundaries of innovation.

Collaborations: Andreas Goebel is known for his collaborative spirit, having partnered with top researchers and engineers in the industry to bring his ideas to life. His ability to work effectively in multidisciplinary teams has led to the successful implementation of his inventions.

Conclusion: Andreas Goebel's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His inventive spirit continues to inspire the next generation of inventors and shape the future of technological advancements.

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