Utrecht, Netherlands

Andreas B G Ariens

This inventor holds 4 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2002-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andreas B G Ariens. Retrieved from https://idiyas.com/inventor/andreas-b-g-ariens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 2002-2008

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4 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Andreas B G Ariens - Revolutionizing Lithographic Projection Technology

Introduction:

Andreas B G Ariens, a prolific inventor based in Utrecht, NL, has made significant contributions to the field of lithographic projection technology. With a total of 4 patents to his name, Ariens is a trailblazer in the industry.

Latest Patents:

Ariens' latest patents include a groundbreaking "Object Positioning Method for a Lithographic Projection Apparatus" and a cutting-edge "Position Measuring System for Use in Lithographic Apparatus." These inventions showcase Ariens' innovative approach to enhancing precision and efficiency in lithographic processes.

Career Highlights:

Currently employed at ASML Netherlands B.V., a leading technology company in the Netherlands, Ariens continues to push the boundaries of technological innovation. His work exemplifies a dedication to advancing lithographic projection technology for the benefit of various industries.

Collaborations:

Ariens has collaborated with talented individuals in his field, including notable coworkers such as Thomas J M Castenmiller and Engelbertus A F van de Pasch. These collaborations have played a crucial role in furthering Ariens' inventive endeavors and driving progress in the field of lithographic projection technology.

Conclusion:

Andreas B G Ariens stands out as a visionary inventor with a remarkable talent for pushing the envelope of technological innovation. His contributions to the field of lithographic projection technology are not only significant but also continue to inspire future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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