Asml Netherlands B.v.

Andreas B G Ariens

Thomas J M Castenmiller

Erik Roelof Loopstra

Patrick David Vogelsang

Engelbertus A F Van De Pasch

Martinus H H Hoeks

YimBun P Kwan

Edwin Johan Buis

Robert-Han Munnig Schmidt

Jan Frederik Hoogkamp

Yim Bun P Kwan

Marcus J H Willems Van Dijk

A method for placement of a object such as a substrate or a mask on a table, said method including:

Object positioning method for a lithographic projection apparatus

A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.

Position measuring system for use in lithographic apparatus

A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.

Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method

In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.

Crash prevention in positioning apparatus for use in lithographic projection apparatus

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Utrecht, Netherlands

Andreas B G Ariens