The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2002
Filed:
Dec. 19, 2000
Yim Bun P. Kwan, Eindhoven, NL;
Engelbertus A. F. van de Pasch, Oirschot, NL;
Andreas B. G. Ariens, Utrecht, NL;
Edwin J. Buis, Belfeld, NL;
Jan F. Hoogkamp, Veldhoven, NL;
Robert-Han Munnig Schmidt, Hapert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.