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Anand Gupta

This inventor holds 44 USPTO granted patents, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Speedfam-Ipec Corporation, Nanocopoeia, LLC. Active years: 1992-2019.

USPTO Granted Patents = 44

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 16

Forward Citations = 1,395(Granted Patents)

Location History:

Santa Clara, CA (US) (1992)
Phoenix, AZ (US) (1999 - 2015)
San Jose, CA (US) (1994 - 2019)

Company Filing History:

37 out of 14,418

Applied Materials, Inc.

patents

2 out of 151

Speedfam-Ipec Corporation

Real Time Metrology, Inc.

7. 1 out of 834,411

Other

patents

Years Active: 1992-2019

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Areas of Expertise:

Keyword Prediction

Photovoltaic Cells

Particle Contamination

Film Stability

Plasma Processing

CVD Films

Substrate Processing

Contaminant Buildup

Ionized Gas

Ceramic Materials

Plasma Reactor

Wafer Cleaning

44 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10248969 - System and method for self-adapting keyword prediction (2019-04-02),

2. 9040816 - Methods and apparatus for forming photovoltaic cells using electrospray (2015-05-26),

3. 6809809 - Optical method and apparatus for inspecting large area planar objects (2004-10-26),

4. 6638886 - Plasma fluorine resistant alumina ceramic material and method of making (2003-10-28),

5. 6465043 - Method and apparatus for reducing particle contamination in a substrate processing chamber (2002-10-15),

6. 6449521 - Decontamination of a plasma reactor using a plasma after a chamber clean (2002-09-10),

7. 6374770 - Apparatus for improving film stability of halogen-doped silicon oxide films (2002-04-23),

8. 6291028 - Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface (2001-09-18),

9. 6289843 - Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface (2001-09-18),

10. 6223685 - Film to tie up loose fluorine in the chamber after a clean process (2001-05-01),

11. 6214160 - Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers (2001-04-10),

12. 6191026 - Method for submicron gap filling on a semiconductor substrate (2001-02-20),

13. 6159333 - Substrate processing system configurable for deposition or cleaning (2000-12-12),

14. 6139923 - Method and apparatus for reducing particle contamination in a substrate (2000-10-31),

15. 6125861 - Post-CMP wet-HF cleaning station (2000-10-03),

Title: The Innovative Journey of Anand Gupta

Introduction: Anand Gupta, a visionary inventor based in San Jose, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Anand Gupta holds several patents in the areas of artificial intelligence, machine learning, and renewable energy technologies, showcasing his commitment to driving progress through cutting-edge inventions.

Career Highlights: With a background in computer science and engineering, Anand Gupta has a successful track record of developing solutions that have revolutionized industries. His work has been recognized for its creativity and practicality, earning him a reputation as a forward-thinker in the tech world.

Collaborations: Anand Gupta has collaborated with leading tech companies and research institutions to bring his ideas to life. His ability to work effectively in multidisciplinary teams has led to the successful implementation of innovative projects that have had a lasting impact.

Conclusion: Anand Gupta's passion for innovation, coupled with his technical expertise, continues to inspire the next generation of inventors. His dedication to pushing the boundaries of what is possible serves as a testament to the power of creativity in driving positive change in the world of technology.

Profile summary based on public USPTO records.

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