The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Apr. 10, 1998
Anand Gupta, Phoenix, AZ (US);
Chris Karlsrud, Chandler, AZ (US);
Periya Gopalan, Chandler, AZ (US);
Daniel R Trojan, Phoenix, AZ (US);
Jeffrey B Cunnane, Wheaton, IL (US);
Jon R MacErnie, Chandler, AZ (US);
SpeedFam-IPEC Corporation, Chandler, AZ (US);
Abstract
The present invention provides an apparatus for cleaning semiconductor workpieces following a Chemical Mechanical Planarization ('CMP') procedure. Initially, a workpiece is scrubbed to remove some of the slurry material and other contaminants on the surfaces of the workpiece. Next, the workpiece is transported into a chemical-etch cleaning station wherein the workpiece is positioned horizontally such that both the upper and lower surfaces are substantially exposed. The workpiece then is immersed in a cleaning solution which is moved around the various surfaces of the workpiece. The workpiece is immersed in the cleaning solution for a sufficient length of time to remove an appropriate layer of oxide, thereby removing contaminants and smoothing micro scratches from the surfaces of the workpiece.